Metrology

Scanning Electron Microscope HITACHI SU8600

Scanning Electron Microscope HITACHI TM4000Plus

KLA-Tencor P-10 Surface Profiler

Measurement of roughness, waviness, step heights on a surface​​​​

KLA-Tencor P-7 Surface Profiler

Measurement of roughness, waviness, step heights on a surface​​​​​

Everbeing SR-4 Resistivity Measurement System

Range from 0.001 to 800k Ohm per square
150 mm probe stand
Keithley 2450 source meter
Tungsten Carbide probe head​​​

Lucas Pro4-640R Resistivity Measurement System

Range from 0.001 to 800k Ohm per square
150 mm probe stand
Keithley2400 source meter
Tungsten Carbide and Osmium probe heads

ThetaMetrisis FR-uProbe

NANOmetrics Nanospec AFT Model 3000

J.A. Woollam M-2000VI Spectroscopic Ellipsometer

Atomic Force Microscope XE150S (Park XE150S AFM)

• Non-contact AFM imaging to investigate and analyze a sample surface
• Supports up to 6" wafers
• 100 µm × 100 µm XY scan range
• Up to 12 µm Z-scan range
• Radius of the probe tip size: 10 nm
• Enhanced acoustic enclosure
• Fully motorized XY-stage travels the entire 150 mm × 150 mm

Film Stress Measurement System SMSi 3800

• Measure the change of curvature induced in a sample due to the deposited film on a reflected substrate
• Measure 1-D stress and produce a 3-D topographical profile
• For wafer flatness and pattern measurements
• Various stress constants
• Wafer sizes:   2" to 8"
• Thickness limit :   less than 11 mm
• Statistical process control and spreadsheet compatibility
• Automatic segmentation calculation

Keyence 3D Laser Confocal Microscope

Keyence VK-X260K 3-D Laser Confocal Microscope provides non-contact, nanometer-level profile, roughness, and film thickness data on any materials

Light sources:   408 nm violet laser source / white-light source
Total magnification:   up to 28000×
Optical microscope:  

• Pinhole confocal optical system
• Four objectives (10×, 20×, 50× & 150×)

Light-receiving element:    16-bit photomultiplier 
Scanning method:  

• Automatic upper/lower limit setting
• High-speed light-intensity optimization (AAGII)
• Poor reflected light intensity supplement (Double Scan)

Stages:  

• Manual XY-Stage
• 70 mm × 70 mm
• Micrometric motorized Z-translation

Resolution:  

• 1 nm lateral resolution
• 0.5 nm Z-axis movement of objective lenses

Observation image:  

• Super-high-resolution color CCD images
• 16-bit laser-color confocal images
• Confocal + ND filter optical system
• C-laser differential interference images

Sample size:  

• Up to 5"
• Maximum sample height 28 mm

Perfict Lab. Probe Station with Keysight B1500A Analyzer

• Probing stage
  • Sample sizes:   Up to 152.4 mm (6")
• Probe:
  • Probe tip holder:   Triaxle cable
  • Current leakage:   <50 fA
  • Probe tip diameter:   20 μm
• Stereo microscope:
  • Optical magnification:   20× – 400×
• Keysight B1500A semiconductor device parameter analyzer:
  • Current-voltage (IV) measurements with 4 HRSMUs (High-Resolution Source-Monitor Units)
  • Current range:   ± 100 mA, measuring resolution 1 fA, sourcing resolution 5 fA
  • Voltage range:   ± 100 V, measuring resolution 0.5 μV, sourcing resolution 25 μV