The NFF (CWB) Phase II Laboratory

The NFF (CWB) Phase II laboratory occupies a floor area of 750 square meters and consists of a plant room and a cleanroom. The plant room is equipped with facilities to support the operation of the cleanroom. The cleanroom provides class 10,000, class 1,000 and class 100 environments and also houses the equipment for front-end wafer processing. A complete 4" silicon wafer processing line is installed in the cleanroom, offering photolithography, thermal diffusion and oxidation, thin-film deposition, dry/wet etching, metallization, implantation, and mask making services.

• Mask-Making Module
• Photolithography Module
• Wet Etching and CMP Module
• Thermal Diffusion and Ion-Implantation Module
• Dry Etching and Sputtering Module
• Metrology
• Other Equipment