The NFF (CWB) Phase II Laboratory

The NFF (CWB) Phase II Laboratory occupies a floor area of 750 square meters. It consists of a cleanroom and a plant room. The cleanroom provides class 100, 1,000 and 10,000 environments. It houses equipment for wafer processing. A complete 4" silicon wafer processing line is installed, offering photolithography, thermal diffusion and oxidation, thin-film deposition, dry/wet etching, metallization, implantation, and mask-making services.

• Mask-Making Module
• Photolithography Module
• Wet Etching and CMP Module
• Thermal Diffusion and Ion-Implantation Module
• Dry Etching and Sputtering Module
• Metrology