Sections
Left Column
Text Area
The NFF (CWB) Phase II Laboratory occupies a floor area of 750 square meters. It consists of a cleanroom and a plant room. The cleanroom provides class 100, 1,000 and 10,000 environments. It houses equipment for wafer processing. A complete 4" silicon wafer processing line is installed, offering photolithography, thermal diffusion and oxidation, thin-film deposition, dry/wet etching, metallization, implantation, and mask-making services.
Text Area
Equipment List
Right Column
Image
Image
![Phase 2 lab_01](/sites/gcnfc2022.prod01.ust.hk/files/2022-04/pic_facilities_phase2lab_01.jpg)
Image
Image
![Phase 2 lab_02](/sites/gcnfc2022.prod01.ust.hk/files/2022-04/pic_facilities_phase2lab_02.jpg)
Image
Image
![phase 2 lab_03](/sites/gcnfc2022.prod01.ust.hk/files/2022-04/pic_facilities_phase2lab_03.jpg)