The NFF (CWB) Enterprise Center

The NFF (CWB) Phase III Laboratory (Enterprise Center) occupies a floor area of 200 square meters. It consists of a cleanroom and a plant room. The cleanroom provides class 100 and 1,000 environments. It houses metallization and basic photolithography equipment for wafer processing.

 

Equipment List

  • AW610 RTP
  • AST 450I Evaporator
  • AST 600EI Evaporator
  • Branson 5510 Ultrasonic Cleaner
  • CEE Hot Plate #2 (90 oC)
  • Cooke Evaporator #2
  • Denton Sputterer
  • EMS Hot Plate #1 (50 oC)
  • HMDS Primer #3
  • Hot Plate (110 oC)
  • IPC 3000 Asher #3
  • JEOL JBX-6300FS E-Beam Lithography System
  • Karl Suss MA6 #1
  • Oven-D (120 oC)
  • Oven-E (105 oC)
  • Oxford RIE Etcher
  • Solitec Coater #1
  • Wet Station M1:MS2001 Resist Strip
  • Wet Station M3:MS2001 Mask Cleaning
  • Wet Station O: HCl Cleaning
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The NFF (CWB) Nanofabrication Demonstration Laboratory
Rm 3114, 3/F (Lift no. 19)
The Hong Kong University of Science and Technology
Clear Water Bay
Kowloon, Hong Kong