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The NFF (CWB) Phase III Laboratory (Enterprise Center) occupies a floor area of 200 square meters. It consists of a cleanroom and a plant room. The cleanroom provides class 100 and 1,000 environments. It houses metallization and basic photolithography equipment for wafer processing.
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Equipment List
- AW610 RTP
- AST 450I Evaporator
- AST 600EI Evaporator
- Branson 5510 Ultrasonic Cleaner
- CEE Hot Plate #2 (90 oC)
- Cooke Evaporator #2
- Denton Sputterer
- EMS Hot Plate #1 (50 oC)
- HMDS Primer #3
- Hot Plate (110 oC)
- IPC 3000 Asher #3
- JEOL JBX-6300FS E-Beam Lithography System
- Karl Suss MA6 #1
- Oven-D (120 oC)
- Oven-E (105 oC)
- Oxford RIE Etcher
- Solitec Coater #1
- Wet Station M1:MS2001 Resist Strip
- Wet Station M3:MS2001 Mask Cleaning
- Wet Station O: HCl Cleaning
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